The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 21, 2017

Filed:

Jan. 26, 2015
Applicant:

Advanced Ion Beam Technology, Inc., Hsin-Chu, TW;

Inventors:

Nicholas White, Manchester, MA (US);

Zhimin Wan, Sunnyvale, CA (US);

Erik Collart, North Andover, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/05 (2006.01); H01J 3/04 (2006.01); H01J 3/26 (2006.01); H01J 37/317 (2006.01); H01J 37/147 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/05 (2013.01); H01J 3/04 (2013.01); H01J 3/26 (2013.01); H01J 37/1472 (2013.01); H01J 37/3007 (2013.01); H01J 37/3171 (2013.01); H01J 2237/04756 (2013.01); H01J 2237/053 (2013.01); H01J 2237/057 (2013.01); H01J 2237/151 (2013.01); H01J 2237/303 (2013.01); H01J 2237/31701 (2013.01);
Abstract

A deceleration apparatus capable of decelerating a short spot beam or a tall ribbon beam is disclosed. In either case, effects tending to degrade the shape of the beam profile are controlled. Caps to shield the ion beam from external potentials are provided. Electrodes whose position and potentials are adjustable are provided, on opposite sides of the beam, to ensure that the shape of the decelerating and deflecting electric fields does not significantly deviate from the optimum shape, even in the presence of the significant space-charge of high current low-energy beams of heavy ions.


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