The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2017
Filed:
Dec. 04, 2014
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate entire region treatment process of discharging a processing fluid of a temperature different from a surface temperature of a substratefrom a first nozzletoward the substrate is performed while moving the first nozzle toward an outer side from an entire region treatment start position Plocated at a central portion to an entire region treatment end position Plocated at a peripheral portion. Then, after moving the first nozzle toward an inner side to a peripheral region treatment start position Plocated at an outer position than the entire region treatment start position P, a substrate peripheral region treatment process of discharging the processing fluid from the first nozzle toward the substrate is performed while moving the first nozzle toward the outer side from the peripheral region treatment start position Pto a peripheral region treatment stop position Plocated at a peripheral portion.