The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2017
Filed:
Apr. 01, 2016
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/04 (2006.01); C30B 25/18 (2006.01); C30B 29/40 (2006.01); C30B 29/48 (2006.01); H01L 21/02 (2006.01); H01L 29/06 (2006.01); H01L 29/165 (2006.01); H01L 29/32 (2006.01);
U.S. Cl.
CPC ...
H01L 29/045 (2013.01); C30B 25/183 (2013.01); C30B 29/40 (2013.01); C30B 29/48 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02433 (2013.01); H01L 21/02521 (2013.01); H01L 21/02532 (2013.01); H01L 21/02598 (2013.01); H01L 21/02609 (2013.01); H01L 21/02639 (2013.01); H01L 21/02647 (2013.01); H01L 29/0688 (2013.01); H01L 29/165 (2013.01); H01L 29/32 (2013.01);
Abstract
Lattice-mismatched epitaxial films formed proximate non-crystalline sidewalls. Embodiments of the invention include formation of facets that direct dislocations in the films to the sidewalls.