The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2017
Filed:
Oct. 30, 2015
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Chia-Feng Liao, Taichung, TW;
Chun-Hsien Lin, Hsinchu, TW;
Pei-Yi Su, Taichung, TW;
Yi-Ming Dai, Hsinchu, TW;
Chung-Hsing Lee, Hsinchu County, TW;
Chien-Ko Liao, Taichung, TW;
Chun-Yung Chang, Hsinchu, TW;
Nan-Jung Chen, Hsinchu, TW;
Pei-Yuan Wu, Hsinchu, TW;
Hsien-Mao Huang, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.