The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
May. 04, 2016
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Leonid Dorf, San Jose, CA (US);
Kenneth S. Collins, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
James D. Carducci, Sunnyvale, CA (US);
Hamid Tavassoli, Cupertino, CA (US);
Olga Regelman, Daly City, CA (US);
Ying Zhang, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/06 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/06 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32422 (2013.01); H01J 37/32458 (2013.01); H01J 37/32532 (2013.01); H01J 37/32357 (2013.01); H01J 2237/3151 (2013.01); H01J 2237/3174 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3348 (2013.01); H01L 21/3065 (2013.01);
Abstract
The disclosure concerns a method of operating a plasma reactor having an electron beam plasma source for independently adjusting electron beam energy, plasma ion energy and radical population. The disclosure further concerns an electron beam source for a plasma reactor having an RF-driven electrode for producing the electron beam.