The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2017
Filed:
Jun. 02, 2014
Air Products and Chemicals, Inc., Allentown, PA (US);
VERSUM MATERIALS US, LLC, Allentown, PA (US);
Abstract
Described herein are precursors and methods for forming silicon-containing films. In one aspect, there is provided an aza-polysilane precursor comprising at least two Si—N bonds, at least one Si—Si bond, and at least two SiHgroups represented by the following Formula IA, IB and IC: wherein Rand Rare independently selected from a linear or branched Cto Calkyl group, a linear or branched Cto Calkenyl group, a linear or branched Cto Calkynyl group, Cto Ccyclic alkyl group, Cto Chetero-cyclic alkyl group, a Cto Caryl group, and a Cto Chetero-aryl group, a Cto Cdialkylamino group, a Cto Ccyclic alkylamino group; Rand Rare independently selected from hydrogen, a linear or branched Cto Calkyl group, a linear or branched Cto Calkenyl group, a linear or branched Cto Calkynyl group, Cto Ccyclic alkyl group, Cto Chetero-cyclic alkyl group, a Cto Caryl group, and a Cto Chetero-aryl group, a Cto Cdialkylamino group, a Cto Ccyclic alkylamino group; wherein Rin Formula IA cannot both be methyl, Rand Rin Formula IB cannot both be iso-propyl, tert-butyl, and bezenyl and Rand Rcannot both be methyl and phenyl.