The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2017
Filed:
Nov. 18, 2014
Oxford Instruments Nanotechnology Tools Limited, Tubney Woods, GB;
Oxford Instruments Nanotechnology Tools Limited, Tubney Woods, GB;
Abstract
A method of electrostatically clamping a dielectric wafer to a processing table during plasma processing is described. The table has interdigitated electrodes embedded therein. The method comprises applying respective voltages of opposite first and second polarities to adjacent electrodes wherein polarization charges are induced in the wafer with opposite polarity to the respective underlying electrodes thereby electrostatically clamping the wafer to the table; and, after a predetermined time (t), reversing the polarities of the voltages so that the polarization charges and electrostatic clamping continues. The on time (t) of each of the first and second polarities is preselected to be The time (t) for switching between the first and second polarities is less than the time (T) and less than 2 seconds.