The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 2017

Filed:

Apr. 24, 2015
Applicant:

Tokyo Electron Limited, Minato-ku, JP;

Inventors:

Takuo Yamamoto, Sapporo, JP;

Yuki Kataoka, Sapporo, JP;

Assignee:

TOKYO ELECTRON LIMITED, Minato-ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01); G05B 13/04 (2006.01); G06N 5/02 (2006.01); F02D 41/14 (2006.01); C23C 16/52 (2006.01); F02D 41/20 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); C23C 16/52 (2013.01); F02D 41/1402 (2013.01); F02D 41/1441 (2013.01); G05B 13/041 (2013.01); G05B 13/042 (2013.01); G06N 5/022 (2013.01); F02D 2041/1412 (2013.01); F02D 2041/1416 (2013.01); F02D 2041/1426 (2013.01); F02D 2041/1433 (2013.01); F02D 2041/2058 (2013.01); F02D 2200/0402 (2013.01); G05B 2219/31103 (2013.01); G05B 2219/32018 (2013.01); G05B 2219/32187 (2013.01); H01L 22/20 (2013.01); H01L 2924/0002 (2013.01); Y02P 90/12 (2015.11); Y02P 90/22 (2015.11);
Abstract

A device for computing correction for control parameter in a manufacturing process executed on a manufacturing apparatus includes circuitry which acquires an index representing fluctuation in a manufacturing apparatus, acquires an apparatus model and a process model, acquires an output from a sensor in the manufacturing apparatus, transforms the output into first fluctuation for a process element, transforms the index into second fluctuation for the process element based on the apparatus model, computes fluctuation for performance indicator from the first and second fluctuation based on the process model, computes correction for the performance indicator from control range for the performance indicator and the fluctuation for the performance indicator, and converts the correction for the performance indicator into correction for each process element based on the process model such that correction for control parameter in process executed on the manufacturing apparatus is computed from the correction converted for each process element.


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