The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2017
Filed:
Mar. 28, 2016
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Kerstin Hild, Schwaebisch Gmuend, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface (), a mirror substrate (), a reflection layer stack () for reflecting electromagnetic radiation that is incident on the optical effective surface, and at least two piezoelectric layers (), which are arranged successively between the mirror substrate and the reflection layer stack in the stack direction of the reflection layer stack and to which an electric field can be applied to produce a locally variable deformation, wherein at least one intermediate layer () made of crystalline material is arranged between the piezoelectric layers (), wherein the intermediate layer is designed to leave an electric field, which is present in the region of the piezoelectric layers () that adjoin the intermediate layer () in the stack direction of the reflection layer stack (), substantially uninfluenced.