The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2017
Filed:
Feb. 26, 2010
Roger R. Coutu, Hooksett, NH (US);
Jill Svenja Becker, Cambridge, MA (US);
Ganesh M. Sundaram, Concord, MA (US);
Eric W. Deguns, Somerville, MA (US);
Roger R. Coutu, Hooksett, NH (US);
Jill Svenja Becker, Cambridge, MA (US);
Ganesh M. Sundaram, Concord, MA (US);
Eric W. Deguns, Somerville, MA (US);
Ultratech, Inc., San Jose, CA (US);
Abstract
A gas deposition system () configured as a dual-chamber 'tower' includes a frame () for supporting two reaction chamber assemblies (), one vertically above the other. Each chamber assembly () includes an outer wall assembly surrounding a hollow chamber () sized to receive a single generation 4.5 (GEN 4.5) glass plate substrate through a load port. The substrate is disposed horizontally inside the hollow chamber () and the chamber assembly () includes removable and cleanable triangular shaped input () and output () plenums disposed external to the hollow chamber () and configured to produce substantially horizontally directed laminar gas flow over a top surface of the substrate. Each chamber includes a cleanable and removable chamber liner assembly () disposed inside the hollow chamber () to contain precursor gases therein thereby preventing contamination of chamber outer walls ().