The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 19, 2017
Filed:
Jun. 30, 2014
Cadence Design Systems, Inc., San Jose, CA (US);
Stefanus Mantik, San Jose, CA (US);
Vassilios C. Gerousis, San Jose, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
Methods and systems for enhancing electronic designs for improving mask designs and manufacturability of electronic circuit designs for multi-exposure lithography are disclosed. The methods identify gap rectangles in a design and create gap blocks with the some of the identified gap rectangles according to at least their positions in a design and design rules. A relation graph is determined among the gap blocks or gap rectangles. The methods adjust some gap blocks by altering their sizes or dimensions. Some gap blocks may be split into multiple smaller gap blocks. The methods convert some gap rectangles into metal fill(s) and/or metal extensions to generate a structured physical design based at least in part upon the gap blocks and/or the multiple smaller gap blocks.