The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 19, 2017

Filed:

Jan. 15, 2014
Applicant:

Shin-etsu Handotai Co., Ltd., Tokyo, JP;

Inventors:

Kazuya Sato, Nasushiobara, JP;

Yuki Tanaka, Nishigo-mura, JP;

Syuichi Kobayashi, Shirakawa, JP;

Kenji Iha, Uruma, JP;

Toshinari Kinjo, Uruma, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/28 (2012.01); B24B 7/22 (2006.01); B24B 7/24 (2006.01); B24B 7/17 (2006.01); B24B 37/08 (2012.01); H01L 21/304 (2006.01); H01L 21/673 (2006.01);
U.S. Cl.
CPC ...
B24B 37/28 (2013.01); B24B 7/17 (2013.01); B24B 7/228 (2013.01); B24B 7/241 (2013.01); B24B 37/08 (2013.01); H01L 21/304 (2013.01); H01L 21/673 (2013.01);
Abstract

A method of producing a carrier for use in a double-side polishing apparatus, the method including engaging an insert with a holding hole formed in a carrier body and sticking the insert to the holding hole, the carrier body being configured to be disposed between upper and lower turn tables to which polishing pads are attached of the double-side polishing apparatus, the holding hole being configured to hold a wafer during polishing, the insert being configured to contact an edge of the wafer to be held, the method including: performing a lapping process and a polishing process on the insert; engaging the insert subjected to the lapping process and the polishing process with the holding hole of the carrier body; and sticking and drying the engaged insert while applying a load to the insert in a direction perpendicular to main surfaces of the carrier body.


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