The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2017
Filed:
Jan. 16, 2015
Projection exposure apparatus for microlithography comprising an optical distance measurement system
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Alexander Wolf, Oberkochen, DE;
Markus Schwab, Aalen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Joachim Hartjes, Aalen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G03F 7/20 (2006.01); H01J 37/317 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G01B 11/14 (2013.01); G03F 7/7085 (2013.01); G03F 7/70775 (2013.01); H01J 37/317 (2013.01); H05G 2/008 (2013.01); H01J 2237/0203 (2013.01); H01J 2237/31777 (2013.01);
Abstract
A projection exposure apparatus () for microlithography has a plurality of optical components (M-M) forming an exposure beam path, as well as a distance measurement system () configured to measure a distance between at least one of the optical components and a reference element (). The distance measurement system comprises a frequency comb generator (), which is configured to generate electromagnetic radiation () having a comb-shaped frequency spectrum.