The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2017

Filed:

Mar. 22, 2012
Applicants:

Koichiro Harada, Toyama, JP;

Noriaki Michita, Toyama, JP;

Tatsushi Ueda, Toyama, JP;

Takayuki Sato, Toyama, JP;

Inventors:

Koichiro Harada, Toyama, JP;

Noriaki Michita, Toyama, JP;

Tatsushi Ueda, Toyama, JP;

Takayuki Sato, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01L 21/687 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68742 (2013.01); H01J 37/32715 (2013.01); H01J 37/32724 (2013.01); H01J 37/32853 (2013.01); H01J 37/32871 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01); H01L 21/67282 (2013.01); H01L 21/68 (2013.01); H01L 21/6875 (2013.01);
Abstract

A substrate supporting member provided in a processing chamber for processing the substrate and configured to support the substrate, has on its upper surface, a protruding area that supports an edge side of the substrate from below; a recessed area provided inside of the protruding area so as not to be brought into contact with the substrate supported by the protruding area; and an auxiliary protruding area formed lower than the protruding area and provided in the recessed area, and has a flow passage that is communicated with inside of the recessed area, for escaping gas between the substrate and the substrate supporting member from the recessed area side.


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