The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 2017
Filed:
Feb. 11, 2016
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Koji Hasegawa, Joetsu, JP;
Masayoshi Sagehashi, Joetsu, JP;
Masahiro Fukushima, Joetsu, JP;
Ryosuke Taniguchi, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/038 (2006.01); G03F 7/039 (2006.01); C08F 224/00 (2006.01); C08F 228/06 (2006.01); C07D 307/04 (2006.01); C07D 493/18 (2006.01); C07D 307/93 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07D 307/04 (2013.01); C07D 307/93 (2013.01); C07D 493/18 (2013.01); C08F 224/00 (2013.01); C08F 228/06 (2013.01); G03F 7/039 (2013.01); G03F 7/325 (2013.01);
Abstract
A polymer for resist use is obtainable from a hemiacetal compound having formula (1) wherein Ris H, CHor CF, Rto Reach are H or a monovalent hydrocarbon group, Xis a divalent hydrocarbon group, ZZ designates a non-aromatic mono- or polycyclic ring of 4 to 20 carbon atoms having a hemiacetal structure, k=0 or 1, and k=0 to 3. A resist composition comprising the polymer displays controlled acid diffusion and low roughness during both positive and negative tone developments.