The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 2017
Filed:
Jun. 11, 2012
Andrew B. Wells, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Clive D. Chandler, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Andrew B. Wells, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Clive D. Chandler, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
A system for creating a substantially planar face in a substrate, the system including directing one or more beams at a first surface of a substrate to remove material from a first location, the beam being offset from a normal to the first surface by a curtaining angle; sweeping the one or more beams in a plane that is perpendicular to the first surface to mill one or more initial cuts, the initial cuts exposing a second surface that is substantially perpendicular to the first surface; rotating the substrate about an axis other than an axis normal to the first beam or parallel to the first beam; directing the first beam at the second surface to remove additional material from the substrate without changing the curtaining angle; and scanning the one or more beams in across the second surface to mill one or more finishing cuts.