The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2017
Filed:
Oct. 31, 2016
Nuflare Technology, Inc., Yokohama-shi, JP;
Nobutaka Kikuiri, Koganei, JP;
Ikunao Isomura, Yokohama, JP;
NuFlare Technology, Inc., Yokohama-shi, JP;
Abstract
A pattern inspection apparatus includes a data processing circuitry to input detection data based on a secondary electron from a substrate for each irradiation unit region, where n×mirradiation unit regions in irradiation unit regions configure one of n×mimage reference regions configuring an inspection measurement image, to calculate, for each of the n×mimage reference regions, a statistic value acquired from the detection data of all the n×mirradiation unit regions in one of the n×mimage reference regions, and to define the statistic value as image reference data for the image reference region, and a comparison processing circuitry to receive transmission of the image reference data for each image reference region, and to compare, using a reference image corresponding to the inspection measurement image composed of the n×mimage reference regions, the measurement image with the reference image for each image reference region.