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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9725618 B1

PDFFull Text
Date of Patent:
Aug. 08, 2017

Filed:

Oct. 03, 2014

Metal-containing resist underlayer film-forming composition containing polyacid

Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Makoto Nakajima, Toyama, JP;

Wataru Shibayama, Toyama, JP;

Hiroyuki Wakayama, Toyama, JP;

Satoshi Takeda, Toyama, JP;

Assignee:

NISSAN CHEMICAL INDUSTRIES, LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Duy Deo

Int. Cl.
CPC ...
C09D 183/04 (2006.01); G03F 7/11 (2006.01); C09D 183/08 (2006.01); C08G 77/26 (2006.01); C08L 83/04 (2006.01); C08L 85/00 (2006.01); C08G 77/00 (2006.01); H01L 21/027 (2006.01); G03F 7/075 (2006.01); G03F 7/09 (2006.01); C08G 77/06 (2006.01); C08G 77/58 (2006.01); C09D 5/00 (2006.01); C09D 7/12 (2006.01); C09D 183/14 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 21/033 (2006.01); C09D 1/00 (2006.01); C08G 77/04 (2006.01); C08K 3/24 (2006.01);
U.S. Cl.
CPC ...
C09D 183/04 (2013.01); C08G 77/06 (2013.01); C08G 77/26 (2013.01); C08G 77/58 (2013.01); C08G 77/80 (2013.01); C08L 83/04 (2013.01); C08L 85/00 (2013.01); C09D 1/00 (2013.01); C09D 5/00 (2013.01); C09D 5/006 (2013.01); C09D 7/1216 (2013.01); C09D 183/08 (2013.01); C09D 183/14 (2013.01); G03F 7/0752 (2013.01); G03F 7/091 (2013.01); G03F 7/094 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); H01L 21/0271 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 21/0338 (2013.01); C08G 77/04 (2013.01); C08K 3/24 (2013.01);
Abstract

A resist underlayer film-forming composition including: (A) component: an isopoly or heteropoly acid, or a salt thereof, or a combination thereof; and (B) component: polysiloxan, poly hafnium oxide or zirconium oxide, or a combination thereof, wherein an amount of the (A) component is 0.1 to 85% by mass of a total amount of the (A) component and the (B) component; and polysiloxan is a hydrolysis-condensation product of hydrolyzable silane of Formula (1):RRSi(R)  Formula (1)and a hydrolyzable silane whose (a+b) is 0 is contained in a proportion of 60 to 85 mol % of a total hydrolyzable silane in Formula (1); the poly hafnium oxide is a hydrolysis-condensation product of hydrolyzable hafnium of Formula (2):Hf(R)  Formula (2)and the zirconium oxide is a hydrolysis-condensation product of hydrolyzable zirconium of Formula (3) or Formula (4):Zr(R)  Formula (3)ZrO(R)  Formula (4)or a hydrolysis-condensation product of a combination thereof.

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