The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 2017

Filed:

May. 19, 2014
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Yasuhira Nagakubo, Tokyo, JP;

Isao Nagaoki, Tokyo, JP;

Hiroaki Matsumoto, Tokyo, JP;

Takeshi Sato, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/20 (2006.01); H01J 37/18 (2006.01); H01J 37/285 (2006.01); G01N 23/22 (2006.01); H01M 8/04664 (2016.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); G01N 23/22 (2013.01); H01J 37/18 (2013.01); H01J 37/285 (2013.01); H01J 2237/006 (2013.01); H01J 2237/188 (2013.01); H01J 2237/2003 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/2806 (2013.01); H01M 8/04671 (2013.01);
Abstract

The objective of the present invention is to maintain the surrounding of a sample at atmospheric pressure and efficiently detect secondary electrons. In a sample chamber of a charged particle device, a sample holder () has: a gas introduction pipe and a gas evacuation pipe for controlling the vicinity of a sample () to be an atmospheric pressure environment; a charged particle passage hole () and a micro-orifice () enabling detection of secondary electrons () emitted from the sample (), co-located above the sample (); and a charged particle passage hole () with a hole diameter larger than the micro-orifice () above the sample () so as to be capable of actively evacuating gas during gas introduction.


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