The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2017

Filed:

Mar. 29, 2016
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Tsung-Yu Chiang, New Taipei, TW;

Wei-Shuo Ho, New Taipei, TW;

Kuang-Hsin Chen, Taoyuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01L 21/3213 (2006.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/51 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 29/4966 (2013.01); H01L 21/31053 (2013.01); H01L 21/321 (2013.01); H01L 21/32133 (2013.01); H01L 21/32138 (2013.01); H01L 29/66545 (2013.01); H01L 21/76897 (2013.01); H01L 29/42376 (2013.01); H01L 29/517 (2013.01);
Abstract

A semiconductor device includes a transistor and a contact pad over a substrate. The transistor includes a high-k dielectric layer, a work function metal layer, a metal gate, two spacers, a metal compound, an insulator and a doped region. The high-k dielectric layer is over the substrate. The work function metal layer is over the high-k dielectric layer. The metal gate is over the work function metal layer. The two spacers sandwich the work function metal layer and the metal gate. The metal compound is over inner walls of the two spacers and over the top surface of the work function metal layer and the metal gate. The insulator covers the metal compound. The doped region is in the substrate. The contact pad is electrically connected to the metal gate.


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