The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Mar. 14, 2016
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method includes processing a first silicon wafer using a first focus condition, the first silicon wafer comprising: a first test pattern and a second test pattern, the first test pattern and the second test pattern being different. The method further includes determining a first critical dimension for the first test pattern, determining a second critical dimension for the second test pattern, determining a delta focus value based on the first critical dimension and the second critical dimension, and processing a second silicon wafer with a second focus condition, the second focus condition based on the delta focus value.