The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Nov. 06, 2012
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Arno Jan Bleeker, Westerhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70558 (2013.01); G03F 7/705 (2013.01); G03F 7/70191 (2013.01); G03F 7/70275 (2013.01); G03F 7/70291 (2013.01); G03F 7/70308 (2013.01); G03F 7/70391 (2013.01); G03F 7/70508 (2013.01); G03F 7/70525 (2013.01); G03F 9/7026 (2013.01);
Abstract
The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.