The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Mar. 09, 2012
Adrianus Fransiscus Petrus Engelen, Waalre, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Robert Kazinczi, Helmond, NL;
Jen-shiang Wang, Sunnyvale, CA (US);
Adrianus Fransiscus Petrus Engelen, Waalre, NL;
Henricus Johannes Lambertus Megens, Waalre, NL;
Johannes Catharinus Hubertus Mulkens, Valkenswaard, NL;
Robert Kazinczi, Helmond, NL;
Jen-Shiang Wang, Sunnyvale, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method of controlling a lithographic apparatus, the method including setting an illumination system of the lithographic apparatus to effect a selected illumination mode, measuring a value of a first parameter of the lithographic apparatus, calculating a value of a second parameter of a projected image of a feature of a test pattern having a plurality of features using a model of the lithographic apparatus and the measured value of the first parameter, and controlling the lithographic apparatus with reference to the calculated value of the second parameter.