The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2017
Filed:
Dec. 16, 2015
Applicant:
Rohm and Haas Electronic Materials Llc, Marlborough, MA (US);
Inventors:
Irvinder Kaur, Northborough, MA (US);
Cong Liu, Shrewsbury, MA (US);
Kevin Rowell, Brighton, MA (US);
Assignee:
Rohm and Haas Electronic Materials LLC, Marlborough, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/42 (2006.01); G03F 7/004 (2006.01); C07C 309/01 (2006.01); C07C 309/28 (2006.01); C07C 309/33 (2006.01); C07C 309/39 (2006.01); C07C 309/40 (2006.01); G03F 7/039 (2006.01); G03F 7/38 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
G03F 7/42 (2013.01); C07C 309/01 (2013.01); C07C 309/28 (2013.01); C07C 309/33 (2013.01); C07C 309/39 (2013.01); C07C 309/40 (2013.01); G03F 7/004 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/38 (2013.01); G03F 7/405 (2013.01);
Abstract
Photoresist pattern trimming compositions are provided. The compositions comprise: a matrix polymer, an aromatic sulfonic acid and a solvent, wherein the aromatic sulfonic acid comprises one or more fluorinated alcohol group. Also provided are methods of trimming a photoresist pattern using the trimming compositions. The compositions and methods find particular applicability in the manufacture of semiconductor devices.