The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
Mar. 05, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Joachim Hartjes, Aalen, DE;
Bernhard Sitek, Heidenheim, DE;
Guenther Dengel, Heidenheim, DE;
Maik-René Piatkowski, Diensdorf-Radlow, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A projection exposure apparatus for microlithography, in particular an EUV projection exposure apparatus, having a beam path along which propagates electromagnetic radiation with which the projection exposure apparatus is operated, and having at least one filter () arranged in the beam path, wherein the projection exposure apparatus furthermore comprises at least one sensor device for monitoring the filter, wherein at least one blocking element () is provided which is movable between a standby position and a bather position, and wherein the movement of the blocking element can be effected at least in a manner dependent on a signal of the sensor device. An associated method for operating an apparatus of this type is also disclosed.