The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2017
Filed:
May. 24, 2013
Applicant:
Uchicago Argonne Llc, Argonne, IL (US);
Inventors:
Seth B. Darling, Chicago, IL (US);
Jeffrey W. Elam, Elmhurst, IL (US);
Yu-Chih Tseng, Westmont, IL (US);
Assignee:
UCHICAGO ARGONNE, LLC, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03C 15/00 (2006.01); G03F 7/00 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); G03F 7/405 (2013.01); H01L 21/0273 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01);
Abstract
Simplified methods of multiple-patterning photolithography using sequential infiltration synthesis to modify the photoresist such that it withstands plasma etching better than unmodified resist and replaces one or more hard masks and/or a freezing step in MPL processes including litho-etch-litho-etch photolithography or litho-freeze-litho-etch photolithography.
Published as: