The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2017

Filed:

Jan. 19, 2016
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventors:

Masatoshi Hirono, Yokohama, JP;

Riki Ogawa, Kawasaki, JP;

Takeshi Fujiwara, Yokohama, JP;

Assignee:

NuFlare Technology, Inc., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/88 (2006.01); G01N 21/95 (2006.01); G03F 1/84 (2012.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G03F 1/84 (2013.01); G01N 2021/95676 (2013.01); G01N 2201/063 (2013.01);
Abstract

According to one embodiment, a defect inspection device includes a first beam splitter configured to branch light into a first optical path and a second optical path, a first optical system on the first optical path, a second optical system on the second optical path, a first aperture configured to form an illumination field of an inspection sample by light from the first optical system, a second aperture configured to form an illumination field of the inspection sample by light from the second optical system, and a third optical system configured to illuminate, with a first illumination, an image of the first aperture on a first area of the inspection sample, and to illuminate, with a second illumination, an image of the second aperture on a second area of the inspection sample.


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