The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 13, 2017

Filed:

Jan. 22, 2014
Applicant:

Avago Technologies General Ip (Singapore) Pte. Ltd., Singapore, SG;

Inventors:

John D. Larson, III, Palo Alto, CA (US);

Jyrki Kaitila, Riemerling, DE;

Stefan Bader, Fort Collins, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 14/06 (2006.01); H03H 3/02 (2006.01); H03H 9/02 (2006.01); H03H 9/58 (2006.01); C23C 14/02 (2006.01); C23C 14/34 (2006.01); H03H 9/17 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02518 (2013.01); C23C 14/025 (2013.01); C23C 14/0617 (2013.01); C23C 14/3414 (2013.01); H03H 3/02 (2013.01); H03H 9/02015 (2013.01); H03H 9/173 (2013.01); H03H 9/175 (2013.01); H03H 9/583 (2013.01); H03H 9/587 (2013.01);
Abstract

A method of fabricating a rare-earth element doped piezoelectric material having a first component, a second component and the rare-earth element. The method includes: providing a substrate; initially flowing hydrogen over the substrate; after the initially flowing of the hydrogen over the substrate, flowing the first component to form the rare-earth element doped piezoelectric material over a surface of a target, the target comprising the rare-earth metal in a certain atomic percentage; and sputtering the rare-earth element doped piezoelectric material from the target on the substrate.


Find Patent Forward Citations

Larson, III, John. (2017). Method of fabricating rare-earth doped piezoelectric material with various amounts of dopants and a selected c-axis orientation (U.S. Patent No. 9679765). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9679765

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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