The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2017
Filed:
Aug. 21, 2015
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventors:
Wen-Li Cheng, Taipei, TW;
Ming-Hui Chih, Luzhou, TW;
Ru-Gun Liu, Zhubei, TW;
Wen-Chun Huang, Tainan, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01); G03F 1/72 (2012.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 1/72 (2013.01);
Abstract
The present disclosure provides a method of performing optical proximity correction (OPC). An integrated circuit (IC) design layout is received. The design layout contains a plurality of IC layout patterns. Two or more of the plurality of IC layout patterns are grouped together. The grouped IC layout patterns are dissected, or target points are set for the grouped IC layout patterns. Thereafter, an OPC process is performed based on the grouped IC layout patterns.