The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2017
Filed:
Apr. 22, 2014
Ebara Corporation, Tokyo, JP;
Toshio Yokoyama, Tokyo, JP;
Junji Kunisawa, Tokyo, JP;
Mitsuru Miyazaki, Tokyo, JP;
Teruaki Hombo, Tokyo, JP;
Naoki Toyomura, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
A substrate processing apparatus has a substrate rotating devicefor holding and rotating a substrate W, a cleaning deviceconfigured to clean a substrate W which is rotated by the substrate rotating deviceat predetermined rotating speed, a movement deviceconfigured to move the cleaning devicebetween a cleaning position Pand a separate position P, and a control unit. The control unitcontrols the movement deviceso that the cleaning devicelocated at the separate position Pstarts moving toward the cleaning position Pbefore a rotating speed of the substrate W held by the substrate rotating devicereaches the predetermined rotating speed and the cleaning devicereaches the cleaning position Pafter a rotating speed of the substrate W reaches the predetermined rotating speed. Therefore, it is possible to improve the throughput in the substrate cleaning step.