The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 30, 2017

Filed:

Dec. 19, 2014
Applicant:

Bruker Nano Inc., Santa Barbara, CA (US);

Inventors:

Joanna Schmit, Tucson, AZ (US);

Erik Novak, Tucson, AZ (US);

Assignee:

BRUKER NANO INC., Santa Barbara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/30 (2006.01); G01N 21/954 (2006.01); H05K 3/00 (2006.01); G01N 21/956 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
G01B 11/303 (2013.01); G01N 21/954 (2013.01); H05K 3/0035 (2013.01); G01B 2210/56 (2013.01); G01N 2021/95653 (2013.01); H05K 1/0366 (2013.01);
Abstract

The rough bottom surface of a recessed feature partially obscured by an overlying structure is profiled interferometrically with acceptable precision using an objective with sufficiently large numerical aperture to illuminate the bottom under the obscuring structure. The light scattering produced by the roughness of the surface causes diffused light to return to the objective and yield reliable data fringes. Under such appropriate numerical-aperture and surface roughness conditions, the bottom surface of such recessed features can be profiled correctly simply by segmenting the correlograms produced by the scan and processing all fringes that correspond to the bottom surface elevation.


Find Patent Forward Citations

Loading…