The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2017

Filed:

Jul. 14, 2015
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Yukio Inazuki, Joetsu, JP;

Takuro Kosaka, Joetsu, JP;

Kazuhiro Nishikawa, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/50 (2012.01); G03F 1/46 (2012.01); G03F 1/54 (2012.01); G03F 1/58 (2012.01); G03F 1/60 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/50 (2013.01); G03F 1/46 (2013.01); G03F 1/54 (2013.01); G03F 1/58 (2013.01); G03F 1/60 (2013.01); G03F 1/80 (2013.01);
Abstract

A binary photomask blank has a light-shielding film on a transparent substrate, the light-shielding film composed mainly of transition metal M and Si, or M, Si and N, and having an optical density of at least 3.0. The light-shielding film includes a layer containing M, Si and N so as to meet the formula: B≦0.68×A+0.23 wherein A is an atomic ratio M/Si and B is an atomic ratio N/Si, and has a thickness of up to 47 nm. The binary photomask blank has a thin light-shielding film capable of fully shielding exposure light.


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Inazuki, Yukio. (2017). Binary photomask blank, preparation thereof, and preparation of binary photomask (U.S. Patent No. 9651858). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9651858

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