The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Aug. 03, 2015
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Takuro Kosaka, Joetsu, JP;
Yukio Inazuki, Joetsu, JP;
Hideo Kaneko, Joetsu, JP;
Toyohisa Sakurada, Joetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A halftone phase shift photomask blank comprising a transparent substrate and a halftone phase shift film consisting of silicon, nitrogen and optional oxygen, and providing a phase shift of 150°-200° relative to light of wavelength up to 200 nm. The phase shift film includes at least one layer meeting the formula: 2×O/Si+3×N/Si≧3.5 wherein Si is a silicon content (at %), N is a nitrogen content (at %), and O is an oxygen content (at %). The phase shift film exhibits satisfactory in-plane uniformity of transmittance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile