The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Aug. 26, 2014
Applicant:

Toyo Tanso Co., Ltd., Osaka-shi, Osaka, JP;

Inventors:

Satoshi Torimi, Kanonji, JP;

Norihito Yabuki, Kanonji, JP;

Satoru Nogami, Kanonji, JP;

Assignee:

TOYO TANSO CO., LTD., Osaka-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); F27D 11/00 (2006.01); H01L 21/67 (2006.01); F27D 7/06 (2006.01); H01L 21/673 (2006.01); F27B 17/00 (2006.01); F27D 5/00 (2006.01); F27D 11/02 (2006.01);
U.S. Cl.
CPC ...
F27D 11/00 (2013.01); F27B 17/0025 (2013.01); F27D 5/0037 (2013.01); F27D 7/06 (2013.01); F27D 11/02 (2013.01); H01L 21/67069 (2013.01); H01L 21/67109 (2013.01); H01L 21/67346 (2013.01); H01L 21/67386 (2013.01); F27D 2005/0081 (2013.01); F27D 2007/063 (2013.01);
Abstract

Provided is a heat treatment container having a small size and capable of efficiently performing a heat treatment on a SiC substrate. A heat treatment container is a container for a heat treatment on a SiC substrateunder Si vapor pressure. The SiC substrateis made of, at least in a surface thereof, single crystal SiC. The heat treatment container includes a container partand a substrate holder. The container partincludes an internal spacein which Si vapor pressure is caused. The internal spaceis partially open. The substrate holderis able to support the SiC substrate. When the substrate holdersupports the SiC substrate, an open portion of the container partis covered so that the internal spaceis hermetically sealed.


Find Patent Forward Citations

Loading…