The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Sep. 08, 2015
Applicant:

Hong Kong Applied Science & Technology Research Institute Company Limited, Hong Kong, HK;

Inventors:

Xiaowu Cai, Shenzhen, CN;

Beiping Yan, Hong Kong, HK;

Zhongzi Chen, Hong Kong, HK;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/02 (2006.01); H01L 29/74 (2006.01); H01L 29/749 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0255 (2013.01); H01L 29/749 (2013.01); H01L 29/7412 (2013.01);
Abstract

A lateral p-n diode in the center of and surrounded by a vertical Silicon-Controlled Rectifier (SCR) forms an Electro-Static-Discharge (ESD) protection structure. The lateral p-n diode has a cross-shaped P+ diode tap with four rectangles of N+ diode regions in each corner of the cross. A P-well under the P+ diode tap is also an anode of a vertical PNPN SCR that has a deep N-well in a P-substrate. The deep N-well surrounds the lateral diode. Triggering MOS transistors are formed just beyond the four ends of the cross shaped P+ diode tap. Each triggering MOS transistor has N+ regions at the edge of the deep N-well and in the P-substrate that act as the cathode terminals. A deep P+ implant region under the N+ region at the edge of the deep N-well decreases a trigger voltage of the vertical SCR.


Find Patent Forward Citations

Cai, Xiaowu. (2017). Lateral-diode, vertical-scr hybrid structure for high-level esd protection (U.S. Patent No. 9640523). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9640523

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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