The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Feb. 16, 2015
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Sang-chul Youn, Suwon-si, KR;

Gyu-hee Park, Hwaseong-si, KR;

Youn-joung Cho, Hwaseong-si, KR;

Haruyoshi Sato, Tokyo, JP;

Takanori Koide, Tokyo, JP;

Naoki Yamada, Tokyo, JP;

Akio Saito, Tokyo, JP;

Akihiro Nishida, Tokyo, JP;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

ADEKA CORPORATION, Higashiogu, Arakawaku, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/06 (2006.01); C07F 15/04 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
C07F 15/045 (2013.01); C23C 16/06 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01); H01L 21/28518 (2013.01); H01L 21/28556 (2013.01);
Abstract

A method of forming a thin film including vaporizing a nickel compound on a substrate using a heterostructured nickel compound including a nickel amidinate ligand and an aliphatic alkoxy group and providing a vapor containing the vaporized nickel compound onto the substrate, thereby forming a nickel-containing layer. Vaporizing the nickel compound on the substrate is performed in an atmosphere in which at least one selected from plasma, heat, light, and voltage is applied.


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