The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Aug. 08, 2013
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Lee-Wee Teo, Singapore, SG;
Ming Zhu, Singapore, SG;
Chi-Ju Lee, Guiren Township, TW;
Sheng-Chen Chung, Jhubei, TW;
Kai-Shyang You, Jhubei, TW;
Harry-Hak-Lay Chuang, Hsinchu, TW;
Abstract
A method of preventing contact metal from protruding into neighboring gate devices to affect work functions of the neighboring gate devices is provided includes forming a gate structure. Forming the gate structure includes forming a work function layer, and forming a gate metal layer having a void, wherein the work function layer surrounds the gate metal layer. The method further includes forming a contact plug having a contact metal directly on the gate metal layer of the first gate stack, wherein the contact metal protrudes into the void, and the work function layer prevents the contact metal from protruding into a second gate stack.