The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Mar. 14, 2014
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Naofumi Kishita, Koshi, JP;

Yuji Sakai, Koshi, JP;

Assignee:

Tokyo Electron Limited, Minato-ku, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 11/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B05C 11/08 (2013.01); G03F 7/162 (2013.01); H01L 21/68714 (2013.01); H01L 21/68735 (2013.01); H01L 21/68785 (2013.01);
Abstract

In one embodiment, a cleaning member has an annular part and an opening positioned radially inside the annular part, and can be moved up and down between a first position and a second position relative to a cleaning nozzle. For cleaning of the back surface of the wafer, the cleaning member is placed at its first position that allows a cleaning liquid to reach the back surface of the substrate through the opening of the cleaning member. For cleaning of the cup structure, the cleaning member placed at its second position higher than the first position is being rotated, and a cleaning liquid discharged from the cleaning nozzle collides with an annular part of the cleaning member and is guided to the inner surface of a cup structure.


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