The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jan. 06, 2016
Applicant:

Kla-tencor Corporation, Milpitas, CA (US);

Inventors:

Ilya Bezel, Sunnyvale, CA (US);

Anatoly Shchemelinin, Pleasanton, CA (US);

Kenneth P. Gross, San Carlos, CA (US);

Richard Solarz, Danville, CA (US);

Lauren Wilson, San Jose, CA (US);

Rahul Yadav, Sunnyvale, CA (US);

Joshua Wittenberg, Fremont, CA (US);

Anant Chimmalgi, San Jose, CA (US);

Xiumei Liu, Fremont, CA (US);

Brooke Bruguier, San Jose, CA (US);

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01); H01J 65/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H01J 65/00 (2013.01); H05G 2/003 (2013.01);
Abstract

A system for forming a laser-sustained plasma includes a gas containment element, an illumination source configured to generate pump illumination, and a collector element. The gas containment element is configured to contain a volume of a gas mixture. The collector element is configured to focus the pump illumination from the pumping source into the volume of the gas mixture contained within the gas containment element in order to generate a plasma within the volume of the gas mixture that emits broadband radiation. The gas mixture filters one or more selected wavelengths of radiation emitted by the plasma.


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