The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Nov. 21, 2014
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Govinda Raj, Bangalore, IN;
Cheng-Hsiung Tsai, Cupertino, CA (US);
Robert T. Hirahara, San Jose, CA (US);
Kadthala R. Narendrnath, San Jose, CA (US);
Manjunatha Koppa, Bangalore, IN;
Ross Marshall, Campbell, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02H 7/30 (2006.01); H01L 21/687 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6875 (2013.01); H01L 21/6831 (2013.01); Y10T 428/24298 (2015.01); Y10T 428/24314 (2015.01);
Abstract
Embodiments are directed to an electrostatic chuck surface having minimum contact area features. More particularly, embodiments of the present invention provide an electrostatic chuck assembly having a pattern of raised, elongated surface features for providing reduced particle generation and reduced wear of substrates and chucking devices.