The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 2017

Filed:

Jun. 19, 2014
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Katsunori Ichino, Koshi, JP;

Kousuke Yoshihara, Koshi, JP;

Yuichi Terashita, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 11/08 (2006.01); H01L 21/67 (2006.01); B05D 1/00 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6715 (2013.01); B05C 11/08 (2013.01); B05D 1/005 (2013.01); G03F 7/162 (2013.01);
Abstract

A coating film forming apparatus includes: a substrate holding unit to horizontally hold a substrate; a rotating mechanism to rotate the substrate held by the substrate holding unit; a coating liquid supplying mechanism to supply coating liquid to form a coating film on the substrate; an annular member to rectify a gas stream above a periphery of the substrate when liquid film of the coating liquid is dried by rotation of the substrate, the annular member being provided above the periphery of the substrate and along a circumferential direction of the substrate so as to cover the periphery of the substrate; and a protrusion provided on an inner periphery of the annular member along circumferential direction of the annular member so as to protrude upward to reduce component of the gas stream flowing directly downward near an inner peripheral edge of the annular member.


Find Patent Forward Citations

Loading…