The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Aug. 02, 2012
Yoshiaki Kageshima, Chichibu, JP;
Tomoyuki Noguchi, Kawasaki, JP;
Daisuke Muto, Chichibu, JP;
Kenji Momose, Chichibu, JP;
Yoshiaki Kageshima, Chichibu, JP;
Tomoyuki Noguchi, Kawasaki, JP;
Daisuke Muto, Chichibu, JP;
Kenji Momose, Chichibu, JP;
SHOWA DENKO K.K., Tokyo, JP;
Abstract
Provided is an epitaxial wafer manufacturing device () that deposits and grows epitaxial layers on the surfaces of wafers W while supplying a raw material gas to a chamber, wherein a shield (), arranged in close proximity to the lower surface of a top plate () so as to prevent deposits from being deposited on the lower surface of the top plate (), is removably attached inside the chamber, has an opening () in the central portion thereof that forces a gas inlet () to face the inside of a reaction space K, and has a structure in which it is concentrically divided into a plurality of ring plates (), () and () around the opening ().