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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9607807 B1

PDFFull Text
Date of Patent:
Mar. 28, 2017

Filed:

Oct. 08, 2015

Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same

Applicant:

Advantest Corporation, Tokyo, JP;

Inventors:

Akio Yamada, Tokyo, JP;

Tatsuro Okawa, Tokyo, JP;

Masahiro Seyama, Tokyo, JP;

Masaki Kurokawa, Tokyo, JP;

Assignee:

Advantest Corp., Tokyo, JP;

Attorney:

Muramatsu & Associates

Primary Examiner:

Nicole Ippolito

Assistant Examiner:

Hanway Chang

Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/304 (2013.01); H01J 37/20 (2013.01); H01J 37/3174 (2013.01); H01J 2237/15 (2013.01); H01J 2237/202 (2013.01); H01J 2237/3175 (2013.01);
Abstract

There is provided a charged particle beam exposure apparatus which turns an array beam including a plurality of charged particle beams, being arranged side by side in a line in a direction intersecting line patterns, on and off at predetermined blanking timing, and thus performs irradiation when irradiated positions of the charged particle beams arrive at pattern positions. The charged particle beam exposure apparatus improves data processing control by segmenting a sample provided with line patterns into a plurality of exposure ranges each at a predetermined length in a direction of movement, and performing on-off control of the beams based on a point of time when the array beam passes on a reference position set in the exposure region.

Find Patent Forward Citations

Yamada, Akio. (2017). Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same (U.S. Patent No. 9607807). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9607807

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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