The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 21, 2017

Filed:

Dec. 31, 2013
Applicant:

Lam Research Ag, Villach, AT;

Inventors:

Rainer Obweger, Lind/Dr., AT;

Andreas Gleissner, Dobriach, AT;

Philipp Engesser, Lindau/Bodensee, DE;

Assignee:

LAM RESEARCH AG, Villach, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 13/02 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 14/50 (2006.01); C30B 25/14 (2006.01); C23C 16/458 (2006.01); C30B 25/12 (2006.01);
U.S. Cl.
CPC ...
B05B 13/0228 (2013.01); H01L 21/6719 (2013.01); H01L 21/67103 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01); C23C 14/505 (2013.01); C23C 16/4584 (2013.01); C30B 25/12 (2013.01); C30B 25/14 (2013.01);
Abstract

An apparatus for processing wafer-shaped articles comprises a closed process chamber providing a gas-tight enclosure. A rotary chuck is located within the closed process chamber, and is adapted to hold a wafer shaped article thereon. A lid is secured to an upper part of the closed process chamber. The lid comprises an annular chamber, gas inlets communicating with the annular chamber and opening on a surface of the lid facing outwardly of the closed process chamber, and gas outlets communicating with the annular chamber and opening on a surface of the lid facing inwardly of the closed process chamber.


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