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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9594310 B1

PDFFull Text
Date of Patent:
Mar. 14, 2017

Filed:

Jul. 18, 2014

Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Marcus Adrianus Van De Kerkhof, Helmond, NL;

Maurits Van Der Schaar, Eindhoven, NL;

Andreas Fuchs, Meerbusch, DE;

Martyn John Coogans, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:

Sterne, Kessler, Goldstein & Fox P.L.L.C.

Primary Examiner:

Peter B Kim

Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G01N 21/47 (2006.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G01N 21/47 (2013.01); G01N 21/4788 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01); G03F 7/70633 (2013.01); G03F 9/7049 (2013.01); G03F 9/7088 (2013.01);
Abstract

The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured. The intensity of each of the first diffraction orders from the diffraction spectrum are compared to determine overlay (or other properties) of exposed layers on the substrate.

Find Patent Forward Citations

Van De Kerkhof, Marcus. (2017). Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method (U.S. Patent No. 9594310). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9594310

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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