The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 07, 2017

Filed:

Feb. 13, 2015
Applicant:

Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;

Inventors:

Deyuan Xiao, Shanghai, CN;

Hanming Wu, Shanghai, CN;

MengFeng Cai, Shanghai, CN;

Shaofeng Yu, Shanghai, CN;

ShiuhWuu Lee, Shanghai, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/225 (2006.01); H01L 21/306 (2006.01); H01L 29/10 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0638 (2013.01); H01L 21/2252 (2013.01); H01L 21/306 (2013.01); H01L 21/30604 (2013.01); H01L 29/105 (2013.01); H01L 29/66795 (2013.01); H01L 29/7854 (2013.01); H01L 21/02238 (2013.01);
Abstract

A fin-type field effect transistor includes a semiconductor body formed on a substrate, the semiconductor body having a top surface and a pair of laterally opposite sidewalls, and a gate electrode formed above the sidewalls and the top surface of the semiconductor body. The semiconductor body further includes a source region formed on an end portion of the semiconductor body, a drain region formed on another end portion of the semiconductor body, and a channel region formed between the source region and the drain region and surrounded by the gate electrode, wherein a doping concentration of the channel region decreases with increasing distance from the top surface and the sidewalls.


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