The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Dec. 18, 2015
Asml Netherlands B.v., Veldhoven, NL;
Rogier Hendrikus Magdalena Cortie, Ittervoort, NL;
Nicolaas Ten Kate, Almkerk, NL;
Niek Jacobus Johannes Roset, Eindhoven, NL;
Michel Riepen, Veldhoven, NL;
Henricus Jozef Castelijns, Bladel, NL;
Cornelius Maria Rops, Waalre, NL;
Jim Vincent Overkamp, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.