The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 2017
Filed:
Nov. 25, 2015
Applicant:
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Inventors:
Ming Zhu, Singapore, SG;
Pinghui Li, Singapore, SG;
Weining Cheng, Singapore, SG;
Yiang Aun Nga, Singapore, SG;
Assignee:
GLOBALFOUNDRIES SINGAPORE PTE. LTD., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/115 (2006.01); H01L 29/66 (2006.01); H01L 21/28 (2006.01); H01L 21/3213 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11524 (2013.01); H01L 21/28273 (2013.01); H01L 21/31051 (2013.01); H01L 21/32139 (2013.01); H01L 27/11531 (2013.01); H01L 29/66545 (2013.01); H01L 29/66825 (2013.01);
Abstract
Devices and methods for fabricating devices with floating gates and replacement metal gates are provided. In an embodiment, a method for fabricating a device includes providing a semiconductor substrate. The method forms a floating gate and a sacrificial gate over the semiconductor substrate. Further, the method replaces the sacrificial gate with a metal gate. After replacing the sacrificial gate with the metal gate, the method forms a control gate over the floating gate.