The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Feb. 25, 2016
Applicant:

Mie Fujitsu Semiconductor Limited, Kuwana, JP;

Inventors:

Teymur Bakhishev, San Jose, CA (US);

Sameer Pradhan, San Jose, CA (US);

Thomas Hoffmann, Los Gatos, CA (US);

Sachin R. Sonkusale, Los Gatos, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 29/10 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1033 (2013.01); H01L 21/02532 (2013.01); H01L 21/26506 (2013.01); H01L 21/26513 (2013.01); H01L 29/105 (2013.01); H01L 29/1083 (2013.01); H01L 29/6659 (2013.01); H01L 29/66568 (2013.01); H01L 29/7833 (2013.01);
Abstract

A transistor device with a tuned dopant profile is fabricated by implanting one or more dopant migrating mitigating material such as carbon. The process conditions for the carbon implant are selected to achieve a desired peak location and height of the dopant profile for each dopant implant, such as boron. Different transistor devices with similar boron implants may be fabricated with different peak locations and heights for their respective dopant profiles by tailoring the carbon implant energy to effect tuned dopant profiles for the boron.


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