The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 21, 2017

Filed:

Aug. 07, 2014
Applicant:

Hong Kong Applied Science and Technology Research Institute Company Limited, Hong Kong, HK;

Inventors:

Yaofeng Sun, Hong Kong, HK;

Minghui Gao, Hong Kong, HK;

Hai Xia, Hong Kong, HK;

Assignee:

Hong Kong Applied Science and Technology Research Institute Company Limited, Hong Kong Science Park, Shatin, New Territories, Hong Kong, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/26 (2006.01); G01N 27/48 (2006.01); C25D 21/12 (2006.01); C25D 21/14 (2006.01); C25D 21/18 (2006.01);
U.S. Cl.
CPC ...
G01N 27/48 (2013.01); C25D 21/12 (2013.01); C25D 21/14 (2013.01); C25D 21/18 (2013.01); G01N 27/26 (2013.01);
Abstract

The presently claimed invention provides an accurate, fast, and cost effective method for determining the additive concentrations of at least two inhibitors simultaneously in an electroplating bath by using different electrical load conditions. The method of the present invention is able to determine additive concentrations of different inhibitors effectively during on-line feedback control for adjusting the amount of additives in the electroplating bath to maintain the additive concentrations within pre-defined limits during device production.


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